Chemical vapour deposition techniques

 Chemical Vapour Deposition (CVD) involves the dissociation and/or chemical reactions of gaseous reactants in an activated (heat, light, plasma) environment, followed by the formation of a stable solid product. The deposition involves homogeneous gas phase reactions, which occur in the gas phase, and/or heterogeneous chemical reactions which occur on/near the vicinity of a heated surface leading to the formation of powders or films, respectively. Though CVD has been used to produce ultrafine powders, this review article is mainly concerned with the CVD of films and coatings.