Chemical
Vapour Deposition (CVD) involves the dissociation and/or chemical reactions of gaseous
reactants in an activated (heat, light, plasma) environment, followed by the
formation of a stable solid product. The deposition involves homogeneous gas
phase reactions, which occur in the gas phase, and/or heterogeneous chemical
reactions which occur on/near the vicinity of a heated surface leading to the
formation of powders or films, respectively. Though CVD has been used to
produce ultrafine powders, this review article is mainly concerned with the CVD
of films and coatings.
